Term: photoresist
https://doi.org/10.1351/goldbook.P04651

Definition:
A photoimaging material, generally applied as a thin film, whose local solubility properties can be altered photochemically. A subsequent development step produces an image which is useful for the fabrication of microelectronic devices (e.g. integrated circuits).

Related Terms:
1) photoimaging (http://doi.org/10.1351/goldbook.I02944).
2) thin film (http://doi.org/10.1351/goldbook.T06345).
3) solubility (http://doi.org/10.1351/goldbook.S05740).

Source: PAC, 1996, 68, 2223. 'Glossary of terms used in photochemistry (IUPAC Recommendations 1996)' on page 2265 (https://doi.org/10.1351/pac199668122223)

Citation: 'photoresist' in IUPAC Compendium of Chemical Terminology, 5th ed. International Union of Pure and Applied Chemistry; 2025. Online version 5.0.0, 2025. https://doi.org/10.1351/goldbook.P04651

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