Term: resist polymer
https://doi.org/10.1351/goldbook.RT07193

Definition:
Polymeric material that, when irradiated, undergoes a marked change in solubility in a given solvent or is ablated.

Notes:
0) A resist polymer under @I03255@ either forms patterns directly or undergoes chemical reactions leading to pattern formation after subsequent processing.
1) A resist material that is optimized for use with @UT07492@ or @VT07496@ light, an electron beam, an ion beam, or X-rays is called a @P04651@, electron-beam resist, ion-beam resist, or X-ray resist, respectively.
2) In a positive-tone resist, also called a positive resist, the material in the irradiated area not covered by a mask is removed, which results in an image with a pattern identical with that on the mask. In a negative-tone resist, also called a negative resist, the non-irradiated area is subsequently removed, which results in an image with a pattern that is the complement of that on the mask.

Related Terms:
1) irradiation (http://doi.org/10.1351/goldbook.I03255).
2) ultraviolet (http://doi.org/10.1351/goldbook.UT07492).
3) visible (http://doi.org/10.1351/goldbook.VT07496).
4) photoresist (http://doi.org/10.1351/goldbook.P04651).
5) polymeric (http://doi.org/10.1351/goldbook.M03667).
6) solubility (http://doi.org/10.1351/goldbook.S05740).

Source: PAC, 2004, 76, 889. 'Definitions of terms relating to reactions of polymers and to functional polymeric materials (IUPAC Recommendations 2003)' on page 903 (https://doi.org/10.1351/pac200476040889)

Citation: 'resist polymer' in IUPAC Compendium of Chemical Terminology, 5th ed. International Union of Pure and Applied Chemistry; 2025. Online version 5.0.0, 2025. https://doi.org/10.1351/goldbook.RT07193

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