focused ion beam system

acronym: FIB
https://doi.org/10.1351/goldbook.09252

Ion beam system used for machining small regions with sub-micron precision.

Notes:
  1. In general, FIBs use a liquid metal ion source to generate a finely focused ion beam with diameters typically in the range 7 nm to 300 nm and of sufficient flux, typically 4 pA to 20 pA, to machine small items for study by Auger electron spectroscopy, secondary-ion mass spectrometry, or transmission electron microscopy in an economic time. They are also used to manufacture scanning probe microscopy tips, those for atom force microscopy having radii down to 2 nm.
  2. FIB-machined surfaces can have an ion-damaged surface that needs to be removed.
Source:
PAC, 2020, 92, 1781. (Glossary of methods and terms used in surface chemical analysis (IUPAC Recommendations 2020)) on page 1805 [Terms] [Paper]
Citation: 'focused ion beam system' in IUPAC Compendium of Chemical Terminology, 5th ed. International Union of Pure and Applied Chemistry; 2025. Online version 5.0.0, 2025. https://doi.org/10.1351/goldbook.09252 RIS BibTex EndNote
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